나노스템프 구동용 중공형 압전액추에이터 기본특성에 관한 연구

국문 초록 (Abstract)

최근, MEMS/NEMS 기술을 이용하여 기능성 나노 구조물을 제작하기 위한 공정기술 중에, 마스터 스템프에 형성된 나노패턴을 웨이퍼 등에 복제할 수 있는 나노임프린트 리소그래피 기술이 활발히 연구되고 있다. 본 연구에서는 기존 멀티헤드방식 나노임프린팅 장비에서 사용되던 전동모터를 대신하여 플렉셔 메커니즘과 결합된 나노스템프를 구동하기 위한 사각 형상의 중공형 압전액추에이터를 설계, 제작하였으며, 제조공정이 다른 각각의 시제품의 변위, 발생력 및 응답특성에 관한 검토를 수행한다. 또한, 압전 액추에이터의 변위제어에 대한 제어수법을 간단히 소개하였으며, 제작한 프로토타입의 PI제어기에 의한 변위 제어결과를 소개한다.

다국어 초록 (Multilingual Abstract)

Nanoimprint lithography has been actively investigated. This method can replicate a nanopatterned master stamp onto a thin polymer film on a silicon substrate and so on. In this study, a square-shaped hollow piezoelectric actuator is presented, which is newly developed. This actuator is used for driving a nanoscale stamp in nanoimprint lithography instead of a conventional electric motor. The fabricated prototype actuator has 95 layers and side lengths of 23 ㎜ and 18 ㎜ for the outer and inner squares, respectively. By adopting a novel process instead of the conventional forming process for fabricating a one-layer actuator, the one-layer is composed of four rectangular segments produced by sawing a ceramic film with a thickness of 0.3 ㎜. The basic characteristics on displacement and generation force of the fabricated prototype actuator are experimentally investigated. Furthermore, the displacement characteristics obtained by using a PI controller are tested and discussed.

목차 (Table of Contents)

• 초록
• Abstract
• 1. 서론
• 2. 제작 및 설계사양
• 3. 실험 및 결과
• 4. 결론
• 후기
• 참고문헌

참고문헌 (Reference)

• 1 Park, S.-Y, "Nanoscale Patterning with the Double-Layered Soft Cylindrical Stamps by Means of UVNanoimprint Lithography" 86 (86): 604-607, 2009
• 2 Lee, J.-J, "Nano-Scale Patterning Using the Roll Typed UV-Nanoimprint Lithography Tool" 85 (85): 861-865, 2008
• 3 Park, S.-Y., "Fabrication of a 3D Stamp with the Microand Nano-Scale Patterens Through Combined NIL and Optical Lithography Processes" 87 : 968-971, 2010
• 4 Ishii, Y, "Fabrication of Three-Dimensional Nanoimprint Mold Using Inorganic Resit in Low Accelerating Voltage Electron Beam Lithography" 84 : 912-915, 2007
• 5 Hwan Soo Jang, "Eliminating the undercut phenomenon in interference lithography for the fabrication of nano-imprint lithography stamp" 한국물리학회 10 (10): 1436-1441, 2010
• 6 Park, J.-H, "Basic Characteristics of Hollow Piezoelectric Actuator for Positioning Nanoscale Stamp" 597-600, 2010
• 7 Hsueh, C.-H., "Analyses of Mechanical Failure in Nanoimprint Processes" 433 : 316-322, 2006