Si CMOS 공정을 적용한 RFID 태그 안테나 제작 및 전기적 특성 = Electrical Properties of RFID Tag Antenna Fabricated by Si CMOS Process

다국어 초록 (Multilingual Abstract)

By using Si CMOS process, small RFID tag antenna were fabricated on Si substrate and their electrical properties were evaluated. Firstly, tag antenna pattern and the electromagnetic properties were simulated with HFSS. The frequency was 13.56 MHz, the line-width and line-gap were modeled in the range of $50{\sim}200{\mu}m$. S parameters, SRF, and Q value were calculated from geometry. When the line-width and line-gap were $100{\mu}m$ and $100 {\mu}m$, respectively and the loop-turn was 10, the SRF was 80 MHZ and the Q value was ca. 9. When the microstrip antenna pattern of aluminum $2{\mu}m$ was fabricated by using DC sputtering, Vpp of ca. 4.3 V was obtained when the reader and tag were closely contacted.

참고문헌 (Reference)

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