플라즈마 발생용 펄스전원 개발 및 전원(DC, AC, Pulse)에 따른 플라즈마 발생전압 비교 = Development of Pulse Power Supply for Plasma Generation and Comparison of Plasma Generation Voltage According to Power Source (DC, AC, Pulse)

다국어 초록 (Multilingual Abstract)

This paper investigates the variations in plasma generation voltage based on different power supply types, including DC, AC, and pulsed sources, to gain deeper insights into their effects on plasma formation and overall efficiency.
Aluminum was chosen as the plasma electrode due to its high electrical conductivity and widespread availability.
Experiments were conducted both in ambient air and using aluminum oxide (Al2O3) as the dielectric material to examine the impact of environmental and material conditions on the plasma generation process. The power supply outputs ranged from 1 to 10kV at a frequency of 10kHz. For the AC source, both square and sine waveforms were utilized. DC and AC voltages were generated with a signal generator and amplifier to control the reference voltage and frequency. Pulsed power was produced using two configurations: a 50μs pulse width generated by a signal generator and amplifier, and a custom-designed power supply capable of producing a 500ns pulse width. The study focused on analyzing the effects of different power types, pulse widths, and waveforms on the plasma generation voltage. This research provides valuable experimental data for optimizing plasma generation by exploring the influence of various power supply configurations. By investigating the roles of DC, AC, and pulsed power in plasma formation, this paper contributes to a more comprehensive understanding of plasma generation mechanisms and offers insights for enhancing the efficiency of plasma systems.