치면열구전색제의 표면처리와 중합시간 증가에 따른 미반응 모노머 용리 평가 = MONOMER RELEASE FROM PIT AND FISSURE SEALANT FOLLOWING BY SURFACE TREATMENT AND CURING TIME

국문 초록 (Abstract)

본 연구는 복합 레진의 중합률에 영향을 미치는 광조사 시간을 달리하여 치면열구전색제를 중합하였을 경우 이로부터 용리되는 미반응 모노머들을 확인하고 정향화하고자 하였다. 그리고 치면열구전색제 중합 후 표면에 나타나는 미반응 모노머 층을 다양한 방법으로 제거한 후 용리되는 미반응 모노머들을 정량분석함으로써 미반응 모노머의 제거효과를 비교 평가하고자 하였다.
광충합 시간에 따라 각각 20초, 40초. 60초간 중합한 후, 중합시간 별로 어떠한 처리도 시행하지 않은 군을 대조군, 증류수로 10초간 세척한 군을 I군(Group I), 75% 알콜에 젖은 면구로 10초간 문지른 군을 ll군(Group II), 퍼미스와 러버컵을 이용하여 10초간 처리하고 증류수로 가볍게 세척한 군을 III군(Group III)으로 분류하였다. 표면처리 후 각 시편을 3차 증류수에 넣고 37℃ 항온 수조에서 10분간 보관한 후 각각의 용리액을 고성능 액체 크로마토그래피를 이용하여 정성 및 정량 분석을 시행하였고 다음과 같은 결과를 얻었다.
1. 모든 대조군과 실험군에서 TEGDMA를 제외한 어떠한 모노머들도 검출되지 않았다
2. 최소 중합시간, 권장 중합시간, 권장 중합시간 이상의 순으로 중합시간이 증가할수록 TEGDMA의 용리량은 감소하였다.
3. 표면처리를 한 군들은 대조군에 비하여 TEGDMA의 용리량이 유의할 만하게 간소하였다.
4. 표면처리를 한 군 가운데 퍼미스와 러버컵을 이용한 경우 잔존 모노머의 제거 효과가 다른 군에 비하여 유의성 있게 높았다.
5. 권장 중합시간 이상인 60초 중합 후, 퍼미스와 러버컵을 이용하여 표면처리한 경우 가장 적은 양의 모노머 용리량을 보였다.

다국어 초록 (Multilingual Abstract)

The purpose of this study was to evaluate the effects of a various light curing time on the residual monomers released from light-cured dental sealant, and to examine the effectiveness of surface treatment in reducing the oxygen-inhibited layer of light-cured dental sealant(Helioseal^(®) F, Vivadent, Liechtenstein). Specimens were cured with a halogen light curing unit(XL 3000, 3M, USA) for 20, 40, 60s. Surface treatment of a light-cured dental sealant included no treatment(control group), a 10-seconds exposure to distilled water(Group I), 10-seconds manual application using a cotton pellet wetted with 75% alcohol(Group II), and 10-seconds application of a water/pumice slurry using a rubber cup on a slow-speed handpiece. The specimens were eluted in distilled water for 10 minutes. All elutes were analyzed by HPLC for identification and quantitive analysis of monomers.
The results of this study can be summarized as follows.
1. None of the chromatograms of the tested sealant displayed peaks with the same retention time as that of the standard solution, except for TEGDMA.
2. The release of TEGDMA decreased with increasing curing time in conventional halogen light.
3. All surface treatment group had a decrease of monomer release in comparison with no treatment group.
4. Treatment that Group III eliminated the greatest amount of any type of residual monomers.
5. The elution of unreacted monomers from curing with halogen curing unit for 60s and Group III was less than other groups.

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